Choice of boron-carbon-nitrogen coating material for electron emission based on photoelectric yield measurements during x-ray absorption studies

Citation
I. Jimenez et al., Choice of boron-carbon-nitrogen coating material for electron emission based on photoelectric yield measurements during x-ray absorption studies, J VAC SCI B, 19(4), 2001, pp. 1358-1365
Citations number
38
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
ISSN journal
10711023 → ACNP
Volume
19
Issue
4
Year of publication
2001
Pages
1358 - 1365
Database
ISI
SICI code
1071-1023(200107/08)19:4<1358:COBCMF>2.0.ZU;2-#
Abstract
Boron-carbon-nitrogen films with different composition and bonding structur es are grown by ion-beam-assisted deposition. The photoelectric yield from these films is used to characterize their potential use as coatings to enha nce electron emission. As excitation light we used soft x rays in the cours e of x ray absorption experiments. In this way, we combine a detailed chemi cal and compositional characterization of the films with their photoelectri c yield. Our results indicate that the main parameter affecting the electro n emission is the proportion of sp(3) hybrids in the film. (C) 2001 America n Vacuum Society.