Hz. Wu et al., Molecular beam epitaxial growth of IV-VI multiple quantum well structures on Si(111) and BaF2(111) and optical studies of epilayer heating, J VAC SCI B, 19(4), 2001, pp. 1447-1454
IV-VI semiconductor multiple quantum well (MQW) structures (PbSe/PbSrSe) we
re grown on Si(111) and BaF2(111) substrates by molecular beam epitaxy. Str
uctural and optical properties of the MQW structures have been studied usin
g reflection high-energy electron diffraction, high resolution x-ray diffra
ction (HRXRD), Fourier-transform infrared (FTIR) transmission, and midinfra
red photoluminescence (PL). Numerous satellite diffraction peaks and narrow
linewidths of the HRXRD rocking curves indicate the high crystalline quali
ty of the structures grown on both Si and BaF2. Longitudinal and oblique va
lley subband transitions without superposed interference fringes were obser
ved in FTIR differential transmission spectra. Continuous wave midinfrared
photoluminescence was also observed from both sets of samples. Comparison o
f FTIR and PL spectra allows determination of localized epilayer heating in
the MQW samples due to optical pumping. For a typical laser pumping power
of 9.1 W/cm(2) the heating in a MQW layer on Si(111) was 70 degreesC, while
the amount of heating for a MQW layer on lower thermal conductivity BaF2 w
as 83 degreesC. (C) 2001 American Vacuum Society.