During crystal growth by vapor deposition, normal incident atoms are deflec
ted toward three-dimensional surface structures. The effect becomes strong
when the atoms are deposited with a low initial kinetic energy. At low T th
is steering effect induces an instability in the growth process, causing a
perfectly flat surface to become rough after a few monolayers are deposited
. Quantitative results for the initial stages of growth of Ag/Ag(100) at T
similar to0 K are presented.