Ammonium phosphate-assisted thermal oxidation of GaAs and InP was shown to
substantially promote the growth of insulating coatings on these semiconduc
tors and to change the growth mechanism. Polyphosphoric acids deposit on ga
llium arsenide and indium phosphide and subsequently react with the constit
uents of the substrate to produce gallium phosphates (for GaAs) and indium
phosphates (for InP).