Nanoalignment mask fabricated directly on Si by AFM

Authors
Huang, WH Dang, XM Hu, Q Xia, Y Tello, M Calleja, M Garcia, R Gomez-Rodnguez, JM Baro, A
Citation
Wh. Huang et al., Nanoalignment mask fabricated directly on Si by AFM, SURF INT AN, 32(1), 2001, pp. 130-132
Citations number
9
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
SURFACE AND INTERFACE ANALYSIS
ISSN journal
01422421 → ACNP
Volume
32
Issue
1
Year of publication
2001
Pages
130 - 132
Database
ISI
SICI code
0142-2421(200108)32:1<130:NMFDOS>2.0.ZU;2-T
Abstract
The alignment mask with submicrometre and nanometre sensitivity is very imp ortant and useful in the microelectronics industry and for nanoscience and technology in the near future. Here we report for the first time a nanoalig nment mask that has been fabricated directly on Si by atomic force microsco py. Copyright (C) 2001 John Wiley & Sons, Ltd.