C. Busse et al., Adatom formation and atomic layer growth on Al(111) by ion bombardment: experiments and molecular dynamics simulations, SURF SCI, 488(3), 2001, pp. 346-366
Rare gas ion bombardment of the Al(1 1 1) surface is found to produce adato
ms with high efficiency, while at the same time stable vacancy clusters in
the bulk are produced, As a result, scanning tunneling microscopy experimen
ts show an initial bombardment-induced growth of several atomic lavers inst
ead of the expected erosion. This phenomenon is observed for Ne+, Ar+, and
Xe+ for temperatures between 100 and 400 K and for ion energies between 0.3
and 8 keV. On the basis of molecular dynamics simulations insight into the
atomic mechanism of bombardment-induced growth is gained. Ion bombardment
causes local melting of the Al crystal near the surface, The energy is rapi
dly transported out of the molten volume, and after a few picoseconds a hig
hly undercooled melt results, which has swollen above the initial surface l
ayer. During recrystallization of the amorphous zone from the crystal inner
towards the surface. vacancy clusters are left at the phase boundary, whic
h stabilize part of the swollen material as adatoms, thus leading to the ob
served bombardment-induced growth. (C) 2001 Elsevier Science B.V. All right
s reserved.