A theoretical study is presented of the adsorption mechanisms and energetic
s of the silyl (SiH3) radical on the pristine Si(0 0 1)-(2 x 1) surface bas
ed on density functional theory and molecular-dynamics (MD) simulations. Ad
sorption mechanisms include: (i) SiH3 attachment to a surface dangling bond
, (ii) dissociative adsorption that involves insertion between dimer atoms
and breaking of the dimer bond, (iii) bonding to two surface dimer atoms of
neighboring pairs in the same dimer row, and (iv) bridging of neighboring
dimer rows. The dissociative adsorption where the Si-Si surface dimer bond
is broken is the most exothermic mechanism. (C) 2001 Published by Elsevier
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