Mechanisms and energetics of SiH3 adsorption on the pristine Si(001)-(2 x 1) surface

Citation
Sp. Walch et al., Mechanisms and energetics of SiH3 adsorption on the pristine Si(001)-(2 x 1) surface, CHEM P LETT, 344(3-4), 2001, pp. 249-255
Citations number
30
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
CHEMICAL PHYSICS LETTERS
ISSN journal
00092614 → ACNP
Volume
344
Issue
3-4
Year of publication
2001
Pages
249 - 255
Database
ISI
SICI code
0009-2614(20010824)344:3-4<249:MAEOSA>2.0.ZU;2-H
Abstract
A theoretical study is presented of the adsorption mechanisms and energetic s of the silyl (SiH3) radical on the pristine Si(0 0 1)-(2 x 1) surface bas ed on density functional theory and molecular-dynamics (MD) simulations. Ad sorption mechanisms include: (i) SiH3 attachment to a surface dangling bond , (ii) dissociative adsorption that involves insertion between dimer atoms and breaking of the dimer bond, (iii) bonding to two surface dimer atoms of neighboring pairs in the same dimer row, and (iv) bridging of neighboring dimer rows. The dissociative adsorption where the Si-Si surface dimer bond is broken is the most exothermic mechanism. (C) 2001 Published by Elsevier Science BY.