Large area high quality diamond film deposition by high power DC arc plasma jet operating at gas recycling mode

Principles of a high power DC arc plasma torch with rotating are roots and the semi-closed gas recycling system are presented. Recent results on large area high quality free standing diamond film deposition by a high power DC arc plasma jet CVD system operating at gas recycling mode is discussed. It was shown that the uniformity of diamond film deposition over a large subs trate area was closely dependent on the uniformity and symmetry of the plas ma, which can be adjusted by proper manipulation of the magnetic field and the effects of fluid dynamics. Effect of gas recycling on the quality of di amond films is discussed. By proper design of the whole system and process optimization, thick uniform diamond wafers of Phi 60-110 mm in diameter wit h a thickness up to 2 mm and transparent diamond wafers of Phi 30-60 mm in diameter has been deposited successfully. It is demonstrated that gas recyc ling can be used even for high quality diamond film synthesis. This is of t echnical and economical importance in the development of high power DC are plasma jet CVD systems for economical fabrication of high quality diamond w afers. (C) 2001 Elsevier Science B.V. All rights reserved.