S. Shimokawa et al., Atomic hydrogen-induced abstraction of adsorbed deuterium atoms on the covalent solid surfaces, DIAM RELAT, 10(9-10), 2001, pp. 1659-1664
Hydrogen (H(g)) abstraction of D adatoms (D-ad) and collision-induced desor
ption (CID), to form D-2 have been comparatively studied on the single crys
taline C, Ge and Si(100) surfaces using a thermal (similar to 0.05 eV) H(g)
beam. Strong HD and D-2 desorptions were observed during exposure on D-ad/
Si(100) and D-ad/Ge(100) surfaces. For both surfaces, it was found that the
CID reaction follows a fourth-order kinetics in the D-ad coverage theta (D
), while as was expected, the abstraction reaction proceeds at a first-orde
r kinetics in D. However, for the fairly smooth D-ad/C(100) surface as rela
xed in the plasma CVD process neither abstraction nor CID were admitted, in
dicating that the D-covered C(100) surface is quite inactive towards the th
ermal H(g) beam particularly at the terrace site. However, it was observed
that H(g) abstraction of D-ad takes place as the D-ad/surface was subjected
to the D(g) beam in a high vacuum reaction chamber, suggesting that D atom
s can stick to the deuterated surface. Sticking efficiency of D atoms was f
ound to become high on the less smooth H-ad/C(100) surface, indicating that
D sticking becomes efficient as the surface becomes rough. It was argued t
hat such additional D sticking to the D or H-terminated C(100) surfaces tak
es place at the step edges or the defect sites rather than at the terraces.
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