Low-frequency noise degradation caused by STI interface effects in SOI-MOSFETs

Citation
H. Lee et al., Low-frequency noise degradation caused by STI interface effects in SOI-MOSFETs, IEEE ELEC D, 22(9), 2001, pp. 449-451
Citations number
9
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
IEEE ELECTRON DEVICE LETTERS
ISSN journal
07413106 → ACNP
Volume
22
Issue
9
Year of publication
2001
Pages
449 - 451
Database
ISI
SICI code
0741-3106(200109)22:9<449:LNDCBS>2.0.ZU;2-9
Abstract
The low-frequency noise characteristics of SOI MOSFETs with shallow trench isolation (STI) structure are investigated for various device sizes with th ree different gate shapes. Devices with channel region butted to the STI sh ow the increase of low-frequency noise as the channel width is reduced. In comparison, the devices without the STI butted to channel region show much less increasing noise power spectral density with the channel width. From t he charge pumping and noise measurement results, the interface-state genera ted by the STI process is identified as the cause of these anomalous phenom ena.