Industrial application of heterostructure device simulation

Citation
V. Palankovski et al., Industrial application of heterostructure device simulation, IEEE J SOLI, 36(9), 2001, pp. 1365-1370
Citations number
37
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
IEEE JOURNAL OF SOLID-STATE CIRCUITS
ISSN journal
00189200 → ACNP
Volume
36
Issue
9
Year of publication
2001
Pages
1365 - 1370
Database
ISI
SICI code
0018-9200(200109)36:9<1365:IAOHDS>2.0.ZU;2-K
Abstract
We give an overview of the state-of-the-art of heterostructure RF-device si mulation for industrial application based on III-V compound semiconductors. The work includes a detailed comparison of device simulators and current t ransport models to be used, and addresses critical modeling issues. Results from two-dimensional hydrodynamic simulations of heterojunction bipolar tr ansistors (HBTs) and high electron mobility transistors (HEMTs) with MINIMO S-NT are presented in good agreement with measured data. The simulation exa mples are chosen to demonstrate technologically important issues which can be addressed and solved by device simulation.