A. Kojima et N. Koshida, Evidence of enlarged drift length in nanocrystalline porous silicon layersby time-of-flight measurements, JPN J A P 1, 40(4B), 2001, pp. 2779-2781
The electron transport mechanism of nanocrystalline porous silicon (PS) has
been studied for a self-supporting PS layer by a time-of-flight (TOF) meas
urement. The observed TOF transient photocurrent curves are different from
those of both single crystalline silicon (c-Si) and amorphous silicon (a-Si
). On the basis of the mobility-lifetime product (mu tau) deduced from TOF
measurements, it is shown that the electron drift length of PS is enhanced
up to 3.8 mum at 100 K and 2.6 mum at 300 K.