Recently, n-type semiconducting diamond was successfully obtained by sulfur
doping using CH4/H2S/H-2 plasma chemical vapor deposition (CVD). It was re
ported that the crystal quality too was improved by the sulfur doping. In t
his study, the equilibrium geometry and the band structure of S- and O-dope
d diamond have been investigated using density function theory (DFT) calcul
ations. Moreover, the sulfur incorporation mechanisms have been investigate
d by the semi-empirical molecular orbital (MO) calculations. Our calculatio
ns revealed that the sulfur atoms are spontaneously incorporated into the d
iamond (100) surface, while the incorporation of the oxygen atoms is unfavo
rable.