Mask films for thermally induced superresolution readout in rewritable phase-change optical disks

Authors
Lu, YH Dimitrov, D Liu, JR Hsieh, TE Shieh, HPD
Citation
Yh. Lu et al., Mask films for thermally induced superresolution readout in rewritable phase-change optical disks, JPN J A P 1, 40(3B), 2001, pp. 1647-1648
Citations number
8
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS → ACNP
Volume
40
Issue
3B
Year of publication
2001
Pages
1647 - 1648
Database
ISI
SICI code
Abstract
Tellurium was studied as a mask film in a thermally induced superresolution rewritable optical disk for detecting below-diffraction-limit marks. Mark trains of 0.15 mum could be retrieved with 9 dB in carrier-to-noise (CNR) u sing an optical system with the laser wavelength of 780 nm and an objective lens of 0.55 numerical aperture. Readout cyclability was examined and meth ods to further improve readout cyclability were proposed.