Optical recording using high numerical-aperture microlens by plasma etching

Authors
Kouchiyama, A Ichimura, I Kishima, K Nakao, T Yamamoto, K Hashimoto, G Iida, A Osato, K
Citation
A. Kouchiyama et al., Optical recording using high numerical-aperture microlens by plasma etching, JPN J A P 1, 40(3B), 2001, pp. 1792-1793
Citations number
2
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS → ACNP
Volume
40
Issue
3B
Year of publication
2001
Pages
1792 - 1793
Database
ISI
SICI code
Abstract
We propose the use of a high numerical-aperture (NA) microlens formed by pl asma etching for an optical recording application. It was found through opt ical recording experiments that a microlens formed by plasma etching is app licable to a tiny objective tens.