Material design of GaN-based ferromagnetic diluted magnetic semiconductors

Citation
K. Sato et H. Katayama-yoshida, Material design of GaN-based ferromagnetic diluted magnetic semiconductors, JPN J A P 2, 40(5B), 2001, pp. L485-L487
Citations number
16
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Volume
40
Issue
5B
Year of publication
2001
Pages
L485 - L487
Database
ISI
SICI code
Abstract
Material design of GaN-based ferromagnetic diluted magnetic semiconductors is given based on ab initio calculations within the local spin density appr oximation. The electronic structure of 3d-transition-metal-atom-doped GaN w as calculated by the Korringa-Kohn-Rostoker method combined with the cohere nt potential approximation. It was found that the ferromagnetic ground stat es were readily achievable in V-, Cr- or Mn-doped GaN without any additiona l carrier doping treatments. A simple explanation on the systematic behavio r of the magnetic states in GaN-based diluted magnetic semiconductors is al so given.