K. Takahashi et al., Fabrication of InGaN multiple quantum wells grown by hydrogen flux modulation in RF molecular beam epitaxy, JPN J A P 2, 40(5B), 2001, pp. L502-L504
We have investigated the effect of atomic hydrogen on In incorporation duri
ng InGaN growth, and that of hydrogen flux modulation on the fabrication of
InGaN multiquantum wells (MQWs) by RF molecular beam epitaxy (MBE). The In
incorporation in InGaN was increased with increasing atomic hydrogen flow
rate, and InGaN MQW structures were successfully funned solely by only modu
lating the hydrogen flux during growth. The InGaN MQW structures have been
fabricated without changing other growth conditions such as Ga and In cell
temperatures, substrate temperature and the RF nitrogen plasma condition. I
t was also found that the average In composition and period of superlattice
increased with increasing hydrogen flow rate.