Fabrication of InGaN multiple quantum wells grown by hydrogen flux modulation in RF molecular beam epitaxy

Citation
K. Takahashi et al., Fabrication of InGaN multiple quantum wells grown by hydrogen flux modulation in RF molecular beam epitaxy, JPN J A P 2, 40(5B), 2001, pp. L502-L504
Citations number
9
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Volume
40
Issue
5B
Year of publication
2001
Pages
L502 - L504
Database
ISI
SICI code
Abstract
We have investigated the effect of atomic hydrogen on In incorporation duri ng InGaN growth, and that of hydrogen flux modulation on the fabrication of InGaN multiquantum wells (MQWs) by RF molecular beam epitaxy (MBE). The In incorporation in InGaN was increased with increasing atomic hydrogen flow rate, and InGaN MQW structures were successfully funned solely by only modu lating the hydrogen flux during growth. The InGaN MQW structures have been fabricated without changing other growth conditions such as Ga and In cell temperatures, substrate temperature and the RF nitrogen plasma condition. I t was also found that the average In composition and period of superlattice increased with increasing hydrogen flow rate.