Fabrication of a micropatterned ridge embedded in a magnetooptic film

We report the fabrication of a crystal or an amorphous micropatterned ridge buried in a magnetooptic film by use of the selected-area sputter epitaxy. The ion-beam bombardment on the deposited amorphous film was found to be i nfluential in crystal growth on an amorphous region. We successfully formed a crystalline single patterned-ridge with 3 mum width. whose cross section was inverted-trapezoidal. into an amorphous region. and an amorphous singl e patterned-ridge, whose cross section was triangular, into a crystal regio n.