Capacitively coupled microplasma source on a chip at atmospheric pressure

Citation
H. Yoshiki et Y. Horiike, Capacitively coupled microplasma source on a chip at atmospheric pressure, JPN J A P 2, 40(4A), 2001, pp. L360-L362
Citations number
7
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Volume
40
Issue
4A
Year of publication
2001
Pages
L360 - L362
Database
ISI
SICI code
Abstract
A small-scale and low-power 13.56 MHz capacitively coupled plasma is genera ted in a capillary, whose cross section is 65-500 x 500-5000 mum, on a quar tz chip of 20 x 20 mm at atmospheric pressure. The capillary is sandwiched between parallel-plate electrodes which are externally located on a chip. A pi -type matching network is miniaturized and appropriately designed to sa tisfy the resonance condition with the excitation frequency, so that helium plasma ignites at an incident power of 1-3 W. The atomic excitation temper ature measured from the intensity distribution of He I lines is about 1900 K at atmospheric pressure. This result suggests that a low-electronic-tempe rature plasma is obtained.