Simulational study of annealing effects in multilayers

The influence of annealing on the interface quality of multilayers presenti ng "back-diffusion" effects is simulated using an Ising lattice gas model. We show that interface roughness has a minimum as a function of the anneali ng temperature (T-a). The probability of breaking the layers is obtained as a function of T-a for different layer thicknesses. We have also calculated the average number of not alike (first and second) neighbors of an atom, w hich can be accessed by nuclear magnetic resonance experiments. (C) 2001 El sevier Science B.V. All rights reserved.