Simulational study of annealing effects in multilayers

Citation
Ar. Lima et al., Simulational study of annealing effects in multilayers, J MAGN MAGN, 226, 2001, pp. 666-668
Citations number
16
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS
ISSN journal
03048853 → ACNP
Volume
226
Year of publication
2001
Part
1
Pages
666 - 668
Database
ISI
SICI code
0304-8853(200105)226:<666:SSOAEI>2.0.ZU;2-F
Abstract
The influence of annealing on the interface quality of multilayers presenti ng "back-diffusion" effects is simulated using an Ising lattice gas model. We show that interface roughness has a minimum as a function of the anneali ng temperature (T-a). The probability of breaking the layers is obtained as a function of T-a for different layer thicknesses. We have also calculated the average number of not alike (first and second) neighbors of an atom, w hich can be accessed by nuclear magnetic resonance experiments. (C) 2001 El sevier Science B.V. All rights reserved.