Effect of planar doping in CO/SiO2-Ni/Cu/Co structures

Citation
H. Wang et al., Effect of planar doping in CO/SiO2-Ni/Cu/Co structures, J MAGN MAGN, 226, 2001, pp. 683-684
Citations number
8
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS
ISSN journal
03048853 → ACNP
Volume
226
Year of publication
2001
Part
1
Pages
683 - 684
Database
ISI
SICI code
0304-8853(200105)226:<683:EOPDIC>2.0.ZU;2-5
Abstract
The effect of interfacial planar doping with insulating granular layer in a sandwiched structure was studied. By inserting a thin SiO2-Ni layer into t he sandwiched Co/Cu/Co structures, the magnetoresistance curve as a functio n of the magnetic field changed significantly because of reduction of inter layer coupling and the change of its switching mechanism of the magnetizati ons by the interface modification. The switching fields are 10 and 60 Oe fo r the magnetization reversals in two magnetic layers. The MR peaks are squa re-shaped with the width of about 30 Oe and the peak MR ratio of 3.3%. (C) 2001 Published by Elsevier Science B.V.