The Nb-based SIS junction fabrication was started in 1996. The main goals o
f this project are to establish the capability of high quality SIS junction
technology in Taiwan and to fabricate SIS mixer for sub-millimeter wave de
tection. In the past few years, we have integrated the fabricating facility
and processing steps. The self-alignment method was used for junction defi
nition process. The junction size is close to 1 mum in order to minimize it
s intrinsic capacitance. The critical current density is required to be gre
ater than or equal to 7.5 kA/cm(2) to get a reasonable omegaR(n)C product o
f the mixer. The high quality SIS junction was demonstrated from its I-V ch
aracteristics. We also fabricated 230 and 350 GHz SIS mixers. The performan
ce test of the mixer shows a low noise temperature level. The details of th
e mixer fabrication process and performance test will be described in this
paper. (C) 2001 Elsevier Science Ltd. All rights reserved.