Trapping levels in (nc-Si/CaF2)(n) multi-quantum wells

Citation
V. Ioannou-sougleridis et al., Trapping levels in (nc-Si/CaF2)(n) multi-quantum wells, MAT SCI E C, 15(1-2), 2001, pp. 45-47
Citations number
10
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
MATERIALS SCIENCE & ENGINEERING C-BIOMIMETIC AND SUPRAMOLECULAR SYSTEMS
ISSN journal
09284931 → ACNP
Volume
15
Issue
1-2
Year of publication
2001
Pages
45 - 47
Database
ISI
SICI code
0928-4931(20010820)15:1-2<45:TLI(MW>2.0.ZU;2-C
Abstract
Trapping levels which govern the vertical transport in (nc-Si/CaF2)(n) mult i-quantum wells were investigated using two different techniques: (a) the t emperature dependence of the dark current and (b) the thermally stimulated depolarization current technique (TSDC). Measurements by the first techniqu e showed that the conduction mechanism was thermally activated above 200 K with activation energies of 0.35-0.7 eV, These activation energies were fou nd to increase with increasing electric field. TSDC measurements showed als o the existence of at least one broad peak above 200 K with estimated activ ation energies in the range of 0.4-0.45 eV. Analysis of the peak by the fra ctional heating method showed a continuous distribution of defect states fr om 0.3 to 0.83 eV. (C) 2001 Elsevier Science B.V. All rights reserved.