Characterisation of new thermosetting polymer materials for nanoimprint lithography

The properties of the thermosetting polymer mr-1-9000, developed and used f or nanoimprint lithography (NIL), were investigated by means of X-ray photo electron spectroscopy (XPS) and Fourier transform infrared spectroscopy (FT IR), The spectra of mr-1-9000 were compared with those of PMMA and show the presence of aromatic rings and a high amount of carbon-carbon and carbon-h ydrogen bonds. As a consequence, the mask selectivity of mr-1-9000 in an ox ygen and tetrafluoromethane reactive ion etching processes is higher than t hat for PMMA and slightly different for the cross-linked and non-cross-link ed state. (C) 2001 Published by Elsevier Science B.V.