Sh. Simpson et S. Hanna, Analysis of the effects arising from the near-field optical microscopy of homogeneous dielectric slabs, OPT COMMUN, 196(1-6), 2001, pp. 17-31
The term "near-field optical microscopy" refers to a range of techniques ca
pable of producing images of surfaces at a resolution far exceeding the Ray
leigh criterion for conventional microscopes. In the illumination mode scan
ning nearfield optical microscope, the sample is placed in the near field o
f an optical source formed from the aperture at the end of a fibre-optic ta
per. In normal operation, the aperture is raster scanned over the sample an
d, by recording the resultant far-field intensity transmitted through the s
ample as a function of the source coordinates, an image is assembled whose
appearance derives from a non-trivial combination of the optical and topolo
gical composition of the sample. In this paper a numerical analysis of the
near-field interaction of the source and sample is performed using a three-
dimensional finite-difference time-domain method. A propagation technique i
s applied to the near-field values to form a far-field signal that is repre
sentative of the signal generated by a real instrument. In this way, the mi
croscope output for a variety of very simple samples is simulated. It is sh
own that the magnitude of the transmitted signal can be increased both by d
ecreasing the separation between source and sample and, in some circumstanc
es, by increasing the sample permittivity. Simulated microscope output from
samples containing topological variation is compared with that produced by
samples containing a variation in refractive index and it is demonstrated
that contrast inversion may occur at different scan heights in the latter c
ase, leading to the possibility of distinguishing between the different con
trast mechanisms experimentally. (C) 2001 Elsevier Science B.V. All rights
reserved.