We report on the effect of the interface between silica and germano-silicat
e glass during thermal poling of optical waveguides. By measuring the depth
of the nonlinear region, using the Maker's fringes technique combined with
etching in hydrofluoric acid, we conclude that the germania-doped layer ac
ts as a barrier for the migration of cations at standard poling temperature
and voltage. It is also found that the problem can be circumvented by poli
ng at higher temperature and voltage, e.g. 320 degreesC and 8 kV. (C) 2001
Published by Elsevier Science B.V.