Adsorption of self-assembling sulfur compounds through electrochemical reactions: Effects of potential, acid and oxidizing agents

Authors
Citation
S. Chon et Wk. Paik, Adsorption of self-assembling sulfur compounds through electrochemical reactions: Effects of potential, acid and oxidizing agents, PHYS CHEM P, 3(16), 2001, pp. 3405-3410
Citations number
33
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
PHYSICAL CHEMISTRY CHEMICAL PHYSICS
ISSN journal
14639076 → ACNP
Volume
3
Issue
16
Year of publication
2001
Pages
3405 - 3410
Database
ISI
SICI code
1463-9076(2001)3:16<3405:AOSSCT>2.0.ZU;2-X
Abstract
Adsorption of organosulfur compounds forming self-assembled monolayers (SAM ) on gold was studied to examine the effects of the electrical potential, a dded redox couple and acidity of the solution on the rate and extent of ads orption. Also, by comparing behavior of the open-circuit potentials of plat inum to those of gold and silver substrates, it was confirmed that no elect rochemical reaction takes place for chemisorption of the organic sulfur com pounds on a Pt surface whereas anodic (in the case of thiols) or cathodic ( in the case of dialkyl disulfides) reactions occur during adsorption on gol d and silver. From an acid solution, the oxidative adsorption of a thiol wa s retarded, whereas the reductive-dissociative adsorption of a disulfide wa s facilitated. Added ferrocene-ferrocenium redox couple enhanced adsorption of the thiol by maintaining the potential of the substrate high, thus prov iding a convenient way to help the formation of adsorbed layers.