S. Chon et Wk. Paik, Adsorption of self-assembling sulfur compounds through electrochemical reactions: Effects of potential, acid and oxidizing agents, PHYS CHEM P, 3(16), 2001, pp. 3405-3410
Adsorption of organosulfur compounds forming self-assembled monolayers (SAM
) on gold was studied to examine the effects of the electrical potential, a
dded redox couple and acidity of the solution on the rate and extent of ads
orption. Also, by comparing behavior of the open-circuit potentials of plat
inum to those of gold and silver substrates, it was confirmed that no elect
rochemical reaction takes place for chemisorption of the organic sulfur com
pounds on a Pt surface whereas anodic (in the case of thiols) or cathodic (
in the case of dialkyl disulfides) reactions occur during adsorption on gol
d and silver. From an acid solution, the oxidative adsorption of a thiol wa
s retarded, whereas the reductive-dissociative adsorption of a disulfide wa
s facilitated. Added ferrocene-ferrocenium redox couple enhanced adsorption
of the thiol by maintaining the potential of the substrate high, thus prov
iding a convenient way to help the formation of adsorbed layers.