Citation
J. Thogersen et al., X-ray emission from femtosecond laser micromachining, APPL PHYS A, 73(3), 2001, pp. 361-363
Citations number
15
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
ISSN journal
09478396
→ ACNP
Volume
73
Issue
3
Year of publication
2001
Pages
361 - 363
Database
ISI
SICI code
0947-8396(200109)73:3<361:XEFFLM>2.0.ZU;2-K
Abstract
We characterize the spectral properties of X-rays generated from selected m
etal and semiconductor targets when 120-fs laser pulses are focused to inte
nsities of similar to 10(14)-3 x 10(15) W/cm(2) during laser micromachining
in air. High fluxes of multi-keV-energy X-rays could be obtained with 280-
muJ pulses at a 1 kHz repetition rate. The yield and spectral composition o
f the X-rays are found to depend sensitively on the processing conditions,
and thus the X-ray emission is expected to be a novel indicator of optimal
laser machining.