Si and SiOx nanostructures formed via thermal evaporation

Various Si and SiOx (x = I to 2) nanostructures were formed via a thermal e vaporation method of heating pure silicon powder at 1373 K under Ar flow. A n alkali-treated quartz glass plate coating with catalyst precursor of a Fe (NO3)(3) aqueous solution was used as substrate. The product exhibited morp hologies of fist-capped SiOx fibers (Si-core), tree-like SiOx nanofibers an d tadpole-like SiOx nanofibers in different areas of the substrate. The dif ferent local temperature gradient, concentration of silicon vapor and silic on oxide vapor, and also the substrate surface condition were suggested to be responsible for the versatile morphologies of the products. (C) 2001 Els evier Science B.V. All rights reserved.