Heat and mass transport computation at the sublimation growth of SiC

Authors
Citation
K. Bottcher, Heat and mass transport computation at the sublimation growth of SiC, CRYST RES T, 36(7), 2001, pp. 719-728
Citations number
16
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
CRYSTAL RESEARCH AND TECHNOLOGY
ISSN journal
02321300 → ACNP
Volume
36
Issue
7
Year of publication
2001
Pages
719 - 728
Database
ISI
SICI code
0232-1300(2001)36:7<719:HAMTCA>2.0.ZU;2-M
Abstract
Steady-state heat and mass transport at the SiC growth process are computed by the general-purpose finite-element package FIDAP (TM). Specific feature s are the radiation exchange in several cavities at temperatures up to 2700 K and concentration dependent Stefan velocities resulting from sublimation /condensation at the vapour-solid interfaces. The article describes the com putational procedure in order to achieve convergence of the temperature and velocity field. The transport rate of the SiC building species meets the r ange of experimental results.