Sh. Lee et al., Influence of microstructure on the chemical diffusion of lithium ions in amorphous lithiated tungsten oxide films, ELECTR ACT, 46(22), 2001, pp. 3415-3419
We describe how the chemical diffusion of lithium ions is affected by micro
structural changes in amorphous lithiated tungsten oxide (a-LixWO3) films a
s a function of lithium ion concentration. The chemical diffusion of lithiu
m ions in a-LixWO3 films is investigated using ac impedance spectroscopy an
d Raman scattering measurements. Two different a-WO3 films deposited by the
rmal evaporation at different partial pressures of nitrogen are used for th
ese measurements. Based on the results of ac impedance spectroscopy and Ram
an scattering measurements, we conclude that the mechanism of these diffusi
on phenomena is attributed to an increase or decrease of the W-6 + =O/O-W6 -O ratio with lithium ion insertion. (C) 2001 Elsevier Science Ltd. All ri
ghts reserved.