WAFER TREATMENT USING ELECTROLYSIS-IONIZED WATER
Citation
H. Aoki et al., WAFER TREATMENT USING ELECTROLYSIS-IONIZED WATER, JPN J A P 1, 33(10), 1994, pp. 5686-5689
Categorie Soggetti
Physics, Applied
Abstract
Electrolysis-ionized water treatment is shown to be useful for removin
g polystyrene particles from contact holes, silicon surface cleaning a
nd the removal of metal contamination such as copper. Electrolysis-ion
ized water has a controllable pH and a higher oxidation-reduction pote
ntial than chemicals. Moreover, this water does not contain acid or al
kaline chemicals, and can easily be neutralized without adding chemica
ls. Electrolysis-ionized water treatment has great potential for ecolo
gically safe and low cost semiconductor processing.