WAFER TREATMENT USING ELECTROLYSIS-IONIZED WATER

Citation
H. Aoki et al., WAFER TREATMENT USING ELECTROLYSIS-IONIZED WATER, JPN J A P 1, 33(10), 1994, pp. 5686-5689
Citations number
4
Categorie Soggetti
Physics, Applied
Volume
33
Issue
10
Year of publication
1994
Pages
5686 - 5689
Database
ISI
Abstract
Electrolysis-ionized water treatment is shown to be useful for removin g polystyrene particles from contact holes, silicon surface cleaning a nd the removal of metal contamination such as copper. Electrolysis-ion ized water has a controllable pH and a higher oxidation-reduction pote ntial than chemicals. Moreover, this water does not contain acid or al kaline chemicals, and can easily be neutralized without adding chemica ls. Electrolysis-ionized water treatment has great potential for ecolo gically safe and low cost semiconductor processing.