Ultraviolet (UV) laser diodes (LDs) whose active layers were composed of qu
aternary AlxInyGa(1-x-y)N were grown on epitaxially laterally overgrown GaN
substrates by a metalorganic chemical vapor deposition method. We investig
ated the Al and In mole fractions dependence of LD characteristics in the U
V region. The emission wavelength of the LDs whose active layers consisted
of Al0.03In0.02Ga0.95N single quantum well (SQW) was 366.4 nm under pulsed
current injection at room temperature. The lasing wavelength was the shorte
st ever reported for III-V nitride-based LDs. The Al0.03In0.03Ga0.94N SQW U
V LDs were demonstrated under 25 degreesC continuous-wave (cw) operation. T
he threshold current density and voltage of these LDs were 3.5 kA/cm(2) and
4.8 V, respectively. The estimated lifetime was approximately 500 h under
25 degreesC ew operation at an output power of 2 mW.