N. Taniyama et al., Diamond deposition on a large-area substrate by plasma-assisted chemical vapor deposition using an antenna-type coaxial microwave plasma generator, JPN J A P 2, 40(7A), 2001, pp. L698-L700
Diamond deposition on a large area silicon wafer substrate (phi 100 mm) is
achieved with a methane/hydrogen plasma induced by an antenna-type coaxial
microwave plasma generator. Deposition of diamond is observed over the enti
re substrate. Diamond precursors arc emitted radially onto a silicon substr
ate from the plasma sphere generated at the tip of the antenna. The possibi
lity of diamond deposition outside the plasma sphere is discussed using a s
emi-empirical equation.