Diamond deposition on a large-area substrate by plasma-assisted chemical vapor deposition using an antenna-type coaxial microwave plasma generator

Citation
N. Taniyama et al., Diamond deposition on a large-area substrate by plasma-assisted chemical vapor deposition using an antenna-type coaxial microwave plasma generator, JPN J A P 2, 40(7A), 2001, pp. L698-L700
Citations number
5
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Volume
40
Issue
7A
Year of publication
2001
Pages
L698 - L700
Database
ISI
SICI code
Abstract
Diamond deposition on a large area silicon wafer substrate (phi 100 mm) is achieved with a methane/hydrogen plasma induced by an antenna-type coaxial microwave plasma generator. Deposition of diamond is observed over the enti re substrate. Diamond precursors arc emitted radially onto a silicon substr ate from the plasma sphere generated at the tip of the antenna. The possibi lity of diamond deposition outside the plasma sphere is discussed using a s emi-empirical equation.