Plasma production by rf fields in the helicon wave frequency range is
investigated by using the rotating field antenna which can select the
azimuthal mode number of the applied rf. The calculated dispersion rel
ation shows that the m = -1 mode helicon wave propagates whereas the m
= +1 mode helicon wave is cut off. The produced helium plasma density
in the case of the m = -1 mode rf application is 1 x 10(13) cm(-3), w
hich is more than 5 times greater than in the case of the m = +1 mode
rf application. The two-dimensional numerical simulation of the rf pla
sma production also qualitatively gives the same result as in the expe
riment. The plasma for the m = +1 mode rf is sustained by the antenna
near field, while for the m = -1 mode rf, it is sustained by the power
absorption from the propagating helicon wave. From both the experimen
t and the simulation, the helicon wave is revealed to increase the pla
sma density from the order of 10(12) cm(-3) to 10(13) cm(-3) by effici
ent power deposition to electrons.