Cleaning of contaminated XUV-optics at BESSY II

Authors
Eggenstein, F Senf, F Zeschke, T Gudat, W
Citation
F. Eggenstein et al., Cleaning of contaminated XUV-optics at BESSY II, NUCL INST A, 467, 2001, pp. 325-328
Citations number
4
Categorie Soggetti
Spectroscopy /Instrumentation/Analytical Sciences","Instrumentation & Measurement
Journal title
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT
ISSN journal
01689002 → ACNP
Volume
467
Year of publication
2001
Part
1
Pages
325 - 328
Database
ISI
SICI code
0168-9002(20010721)467:<325:COCXAB>2.0.ZU;2-C
Abstract
Carbon contaminations as observed on XUV-optics can be removed by an in sit u plasma discharge process. The method developed at BESSY is based on water free oxygen/argon mixture and avoids water contamination of the UHV-equipme nt. The radio frequency based plasma cleaning method has been used at several u ndulator beamlines at BESSY II with a gain in flux at the carbon K-edge, At the UE56-I-plane grating monochromator, a gain in flux up to a factor 20 i s observed. No loss in flux has been observed across the whole energy range s of the "cleaned" beamlines. (C) 2001 Published by Elsevier Science B.V.