A beam line BL11 is constructed for exposure Hard X-ray Lithography (HXL) i
n the LIGA (German acronym for Lithographite Galvanoformung and Abformung)
process at the synchrotron radiation (SR) facility NewSUBARU of the Laborat
ory of Advanced Science and Technology for Industry (LASTI) in Himeji Insti
tute of Technology (HIT). This beam line was designed by the criteria; phot
on energy range 4-6 keV, a beam spot size on the exposure stage greater tha
n or equal to 60 x 5 mm(2), a density of total irradiated photons greater t
han or equal to 10(11) photonS/cm(2). The PMMA sheet etching was successful
ly demonstrated by using the output beam. We conclude that this beam line p
erforms sufficiently well to study the exposure of HXL in the LIGA process.
(C) 2001 Elsevier Science B.V. Ali rights reserved.