Feasibility of the electron structure modification of a semiconductor emitt
er surface by a sub-monolayer that can be used to improve the photofield-em
ission properties of a semiconductor is demonstrated. For this aim the pecu
liarities of oxygen adsorption on the atomically clean germanium surface at
300 K and 77 K for various exposures are studied by field microscopy techn
ique. The electron energy distribution change caused by adsorption is measu
red for the atomically clean gallium arsenide surface.