Epitaxial growth, electronic properties, and photocathode applications of strained pseudomorphic InGaAsP/GaAs layers

Citation
Vl. Alperovich et al., Epitaxial growth, electronic properties, and photocathode applications of strained pseudomorphic InGaAsP/GaAs layers, SEMICONDUCT, 35(9), 2001, pp. 1054-1062
Citations number
29
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
SEMICONDUCTORS
ISSN journal
10637826 → ACNP
Volume
35
Issue
9
Year of publication
2001
Pages
1054 - 1062
Database
ISI
SICI code
1063-7826(2001)35:9<1054:EGEPAP>2.0.ZU;2-B
Abstract
The results of experimental and theoretical investigations directed toward the development of highly efficient sources of spin-polarized electrons are reported. The sources are based on heteroepitaxial elastically strained fi lms of the quaternary InGaAsP solid solution grown by liquid-phase epitaxy on GaAs substrates. The InGaAsP films synthesized were 0.1-0.2 mum thick wi th the band gap being within the range of 1.4-1.9 eV and having elastic str ains as high as 1%. This provided splitting of the valence band top by 40-6 0 meV and a degree of the spin polarization P of the electrons photoemitted as high as 80%. The films have a high quantum yield of photoemission Y upo n activating to the negative electron affinity state due to the adsorption of Cs and O. Record values for the effective figure of merit (PY)-Y-2 are a chieved. (C) 2001 MAIK "Nauka/Interperiodica".