A new diode structure, called planar MOS-Schottky Diode (MOSSD), is propose
d to reduce the reverse leakage current in SiC Schottky diode. The reverse
leakage current has been reduced by one order of magnitude by using the MOS
SD structure while the reverse breakdown characteristic is improved from so
ft breakdown to abrupt breakdown. Further, measurements on MOSSDs with thic
k and thin oxide MOS regions indicate that the forward current through a MO
SSD with a thin oxide can be up to 90% that through a conventional Schottky
diode without buried MOS structures. From high temperature measurements it
is evident that the reverse characteristics of MOSSDs have less temperatur
e dependence compared to pure Schottky diodes. (C) 2001 Elsevier Science Lt
d. All rights reserved.