p-Pivaloyloxybenzenesulfonyl and methylsulfonyl residues were used as linke
rs to attach secondary alcohols to Wang resin and to Merrifield resin, resp
ectively. p-Pivaloyloxybenzenesulfonates of alcohols were deprotected at th
e phenolic group and coupled with Wang resin by Mitsunobu reaction whereas
mesylates were lithiated at the methyl group and subsequently connected wit
h chloromethyl residues of Merrifield resin.