REDISTRIBUTION OF IMPLANTED IMPURITY DURI NG IMPULSE LASER EXCITATION

Authors
MARKEVICH MI PISKUNOV FA CHAPLANOV AM MATUSEVICH LV CHAO C
Citation
Mi. Markevich et al., REDISTRIBUTION OF IMPLANTED IMPURITY DURI NG IMPULSE LASER EXCITATION, Doklady Akademii nauk BSSR, 41(1), 1997, pp. 50-54
Citations number
8
Categorie Soggetti
Multidisciplinary Sciences
Journal title
Doklady Akademii nauk BSSR → ACNP
ISSN journal
0002354X
Volume
41
Issue
1
Year of publication
1997
Pages
50 - 54
Database
ISI
SICI code
0002-354X(1997)41:1<50:ROIIDN>2.0.ZU;2-N
Abstract
A general numerical solution of the one-dimensional heal diffusion and diffusion equation respectively used to calculate the temperature of a surface and the redistribution of B in Si exposed to pulsed heating. The numerical solution (based on a finite difference model) is in a g ood agreement with experimental measurements.