Origin of photoluminescence around 2.6-2.9 eV in silicon oxynitride
Citation
T. Noma et al., Origin of photoluminescence around 2.6-2.9 eV in silicon oxynitride, APPL PHYS L, 79(13), 2001, pp. 1995-1997
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
SICI code
0003-6951(20010924)79:13<1995:OOPA2E>2.0.ZU;2-J
Abstract
A broad photoluminescence (PL) around 2.6-2.9 eV is known to appear in hydr
ogenated silicon oxynitride. Although its origin was reported to be Si-N bo
nds, it is not so clear since the material contains hydrogen. In the presen
t research, we have confirmed that the same PL appears in silicon oxynitrid
e grown by nitriding of silicon dioxide. The depth profile of the PL intens
ity agrees with that of the nitrogen concentration. Furthermore, the emissi
on spectrum, excitation spectrum, and decay constant of this PL agree with
those of the PL observed in silicon nitride. Based on these results and the
oretical discussion, the origin of the 2.6-2.9 eV PL is estimated to be Si-
N bonds. (C) 2001 American Institute of Physics.