Origin of photoluminescence around 2.6-2.9 eV in silicon oxynitride

Citation
T. Noma et al., Origin of photoluminescence around 2.6-2.9 eV in silicon oxynitride, APPL PHYS L, 79(13), 2001, pp. 1995-1997
Citations number
16
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
79
Issue
13
Year of publication
2001
Pages
1995 - 1997
Database
ISI
SICI code
0003-6951(20010924)79:13<1995:OOPA2E>2.0.ZU;2-J
Abstract
A broad photoluminescence (PL) around 2.6-2.9 eV is known to appear in hydr ogenated silicon oxynitride. Although its origin was reported to be Si-N bo nds, it is not so clear since the material contains hydrogen. In the presen t research, we have confirmed that the same PL appears in silicon oxynitrid e grown by nitriding of silicon dioxide. The depth profile of the PL intens ity agrees with that of the nitrogen concentration. Furthermore, the emissi on spectrum, excitation spectrum, and decay constant of this PL agree with those of the PL observed in silicon nitride. Based on these results and the oretical discussion, the origin of the 2.6-2.9 eV PL is estimated to be Si- N bonds. (C) 2001 American Institute of Physics.