Impact of domain wall displacements on the dielectric permittivity of epitaxial Ba0.5Sr0.5TiO3 films

Citation
Ya. Boikov et T. Claeson, Impact of domain wall displacements on the dielectric permittivity of epitaxial Ba0.5Sr0.5TiO3 films, APPL PHYS L, 79(13), 2001, pp. 2052-2054
Citations number
15
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
79
Issue
13
Year of publication
2001
Pages
2052 - 2054
Database
ISI
SICI code
0003-6951(20010924)79:13<2052:IODWDO>2.0.ZU;2-P
Abstract
Contributions of ferroelectric domain wall oscillations to the loss factor, tan delta, and the real part of the dielectric permittivity, epsilon ('), of 700 nm thick Ba0.5Sr0.5TiO3 layers were considered. The domain wall rela ted relaxation in the ferroelectric layer exhibited thermally activated beh avior with a hindering barrier phi approximate to0.08 eV. The tan delta (T) of the layer peaked and there was a hump anomaly in epsilon'(T) at a tempe rature where the relaxation rate matched the frequency of measurement. (C) 2001 American Institute of Physics.