Surface kinetics in copper CVD

The surface kinetics of low temperature (100 degreesC < T < 150 degreesC) C VD of copper from Cu(hfac)VTMS are studied, and a novelmonorhoic model is a pplied to describe these kinetics. This model contains no reversible reacti ons and only those reactions between gas phase and surface species are allo wed. A mechanism, consisting of four reaction steps, is proposed and is fou nd to fit the experimental data well, even when the data are from experimen ts conducted at two different temperatures. The desorption of *Cu(hfac)(2) appears to be very rapid. Based on the results, a mechanism is proposed to describe literature results on a Cu(hfac)(2) CVD system.