Kinetics of pinned layer and free layer relaxation upon hard axis anneal of NiMn spin valves

Citation
L. Baril et al., Kinetics of pinned layer and free layer relaxation upon hard axis anneal of NiMn spin valves, IEEE MAGNET, 37(4), 2001, pp. 1698-1700
Citations number
9
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
IEEE TRANSACTIONS ON MAGNETICS
ISSN journal
00189464 → ACNP
Volume
37
Issue
4
Year of publication
2001
Part
1
Pages
1698 - 1700
Database
ISI
SICI code
0018-9464(200107)37:4<1698:KOPLAF>2.0.ZU;2-H
Abstract
We discuss the results of a systematic study of the magnetic stability of b oth free and pinned layers in NiMn based spin valves upon hard axis anneals at temperatures ranging from 120 degreesC to 200 degreesC. For the free la yer, the relaxation of the anisotropy follows a T In(t) dependence, where T is the anneal temperature and t is the anneal time. By contrast, the rotat ion of the pinned layer unidirectional anisotropy angle does not follow a s imple logarithmic time dependence. A further difference lies in the relaxat ion rate, which in these particular spin valves is much more rapid for the free layer than the pinned layer. Significant training effects are observed when the sample is subjected to repeated major easy axis loops. In additio n to the well known shrinkage of the pinned layer loop, we find that the tr aining is associated with a net rotation of the unidirectional axis be as m uch as 10 degrees.