Effect of N doping on structure and properties of DLC films produced by plasma beam deposition

A novel plasma beam source for the deposition of DLC films is described. Wi de ranges of ion energy (130-250 eV) and C2H2/N-2 flow conditions have been used to investigate the effect of N doping on the structure and properties of DLC films. The resulting films are characterized by their chemical comp osition, Raman spectra, electron spin density, mass density, and hardness, which critically depend on the N content. The addition of N causes the spl carbon content in the DLC films to increase and results in lower density an d hardness. The film density also decreases with increasing ion energy at h igh N concentrations. Carbon films with maximum density and hardness of 2.1 g/cm(3) and 25 GPa, respectively, can be produced using the plasma beam so urce.