We investigated the magnetic properties of as-sputtered FeTaN films as a fu
nction of deposition temperature and composition. At the deposition tempera
ture higher than 200 degreesC, both soft magnetism and magnetic moments can
be fully achieved. While the Th and N contents in the films affect the mag
netic properties, the N content exhibits stronger effects. The magnetic pro
perties are affected by the film microstructures via. crystallinity, grain
size, and formation of FexN phases. An excessive N incorporation into the f
ilms causes incomplete crystallization and/or formation of Fe3N phases in t
he as-deposited state, leading to a poor soft magnetic property. As-deposit
ed FeTaN film at the optimum composition of Fe91.7Ta4.2N4.1 gives the best
soft magnetic properties; coercivity of similar to2 Oe and permeability of
similar to 1600 stable up to the frequency of 100 MHz.