Domain structure of TbFe magnetostrictive films by MFM

TbFe thin films with giant magnetostriction were deposited by DC magnetron sputtering onto Si(100) substrate at different sputtering parameters, inclu ding substrate temperatures (Ts, 20-420 degreesC), sputtering power (35-100 W) and sputtering time (5-30 min). The samples were amorphous as character ized by XRD. Effect of sputtering parameters on domain structure, as explor ed by magnetic force microscopy (MFM), was focused. The films prepared unde r different sputtering parameters showed different domain patterns, such as maze or/and spotty (bubble) ones. The easy axis either in-plane or out-of- plane is affected by film-deposition parameters, specifically the film thic kness. The wall energy (L gamma) increases with film thickness, leading to looser bubble domains while the magnetic anisotropy constant (K-u) decrease s with increasing substrate temperature.