A thermally stable silica/p-anisidine material was obtained by a sol-gel me
thod in two steps: (a) p-anisidine was reacted with 3-chloropropyltrimethox
ysilane using NaH as a base activator and; (b) the resulting product of thi
s reaction, p-anisidinepropyltrimethoxysilane (AnPTMS), was condensed with
tetraethylorthosilicate. The sol-gel materials were obtained by using the A
nPTMS precursor at concentrations of 0.05, 0.15, 0.23, 0.35, and 0.46 mol L
-1. The thermal stability of the organic attached groups increases with the
AnPTMS precursor concentration added. For the 0.35 and 0.46 mol L-1 cases,
the resulting materials were thermally stable up to 300 degreesC, under va
cuum. (C) 2001 Academic Press.